ZnO THIN FILMS PREPARED BY ATOMIC LAYER DEPOSITION

Paulina Boryło, Krzysztof Lukaszkowicz

Abstract


The purpose of this paper is present the influence of deposition conditions of nanometric zinc oxide thin films using atomic layer deposition
on the mechanical and optical properties. The influence of the deposition temperature and the number of cycles on the transparency and adhesion
of the ZnO, thin films was investigated. In addition, the results of chemical and phase composition analysis of the layers and their topography and structure were discussed. As a substrate for the investigated thin films was used glass.
For the preparation of ZnO thin films was used ALD method. Selecting this method is justified by the high quality and good properties of the deposited layers.


Keywords


Low ZnO; ALD; SEM; TEM; UV-VIS; Scratch test.

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